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MPI-INF D4 Publications, generated: 7:33, 21 November 2019

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Your search returned the following 2 documents:

  1. Jens Kerber, Art Tevs, Rhaleb Zayer, Alexander Belyaev, and Hans-Peter Seidel
    Feature Sensitive Bas Relief Generation
    In: SMI 2009 : IEEE International Conference on Shape Modeling and Applications Proceedings, Beijing, China, 2009, 148-154

  2. Renato Pajarola and Michela Spagnuolo(Ed.)
    Francesco Banterle, Alessandro Artusi, Tunc O. Aydin, Piotr Didyk, Elmar Eisemann, Diego Gutierrez, Rafal Mantiuk, Karol Myszkowski, and Tobias Ritschel
    Mapping Images to Target Devices: Spatial, Temporal, Stereo, Tone, and Color
    EUROGRAPHICS 2012 - Tutorials