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Technischer-, Forschungsbericht


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Author, Editor

Author(s):

Hopf, Jörn

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Editor(s):

Claus, Volker
Hopf, Jörn
Schwefel, Hans-Paul

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dblp
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BibTeX Citekey*:

Hopf96b

Language:

English

Title, Institution

Title*:

Optimizing Photo Mask Layout for Grey-tone Lithography

Institution*:

IBFI

Publishers or Institutions Address*:

IBFI GmbH, Schloss Dagstuhl, D-66687 Wadern, Germany

Type:

Dagstuhl-Seminar-Report

No, Year, pp.,

Number*:

140

Pages*:

1

Month:

March

VG Wort
Pages*:


Year*:

1996

ISBN/ISSN:

0940-1121





DOI:




Note, Abstract, ©

Note:


(LaTeX) Abstract:


Categories / Keywords:


Copyright Message:


HyperLinks / References / URLs:

http://www.dag.uni-sb.de/reporte/liste.96.html

Personal Comments:


File Upload:


Download
Access Level:


Correlation

MPG Unit:

Max-Planck-Institut für Informatik



MPG Subunit:

Programming Logics Group

Audience:

experts only

Appearance:

working group publication list


BibTeX Entry:
@TECHREPORT{Hopf96b,
AUTHOR = {Hopf, J{\"o}rn},
EDITOR = {Claus, Volker and Hopf, J{\"o}rn and Schwefel, Hans-Paul},
TITLE = {Optimizing Photo Mask Layout for Grey-tone Lithography},
YEAR = {1996},
TYPE = {Dagstuhl-Seminar-Report},
INSTITUTION = {IBFI},
NUMBER = {140},
PAGES = {1},
ADDRESS = {IBFI GmbH, Schloss Dagstuhl, D-66687 Wadern, Germany},
MONTH = {March},
ISBN = {0940-1121},
}


Entry last modified by Uwe Brahm, 08/28/2014
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Editor(s)
[Library]
Created
05/28/1997 04:32:40 PM
Revisions
5.
4.
3.
2.
1.
Editor(s)
Uwe Brahm
Uwe Brahm
Jörn Hopf
Jörn Hopf
Jörn Hopf
Edit Dates
24.03.97 22:41:08
05.03.97 17:56:17
26/02/97 21:28:39
26/02/97 21:26:34
25/02/97 18:54:05